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Postdocs on Ultrafast Soft-x-ray Metrology and High-harmonic Metrology

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AMSTERDAM, Netherlands, NLfull timePosted July 16, 2026via europa.eu

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via EURES (European Labour Authority, europa.eu/eures)

Logo of EURAXESS Job offer AcademicTransfer - JOB - Netherlands - Posted on: 21 May 2026 Page contents 21 May 2026 ARCNL Research Field Physics » Metrology Physics » Optics Researcher Profile Recognised Researcher (R2) Application Deadline 15 Nov 2026 - 20:33 (UTC) Country Netherlands Type of Contract Temporary Job Status Not Applicable Hours Per Week 40.0 Is the job funded through the EU Research Framework Programme? Not funded by a EU programme Is the Job related to staff position within a Research Infrastructure? No Offer Description Work Activities The High-harmonic generation and EUV science group at ARCNL, Amsterdam, has openings for two positions for postdoctoral researchers (2-year contracts). Project 1: You will contribute to some of our ongoing investigations to develop new ultrafast femtosecond to attosecond time-scale semiconductor spectroscopy, imaging and metrology techniques in the soft-X-ray spectral range based on a laboratory-based high-harmonic generation setup. This includes developing soft-X-ray spectroscopic scatterometry to measure nanoscale features of various multilayer semiconductor structures, and develop ultrafast metrology to characterize electrical contacts between different layers in a non-contact way. Your research will contribute to bringing the fundamental field of attosecond science in contact with industrial applications to measure nanoscale structures. Finally, you will use the developed techniques to study dynamics and phase transitions in strongly correlated materials. Project 2: In the second project you will further develop harmonic deactivation microscopy (HADES) to study nanoscale sub-wavelength semiconductor structures. Our group recently demonstrated that high-harmonic generation from solids can be optically suppressed and spatially confined in semiconductors without the need for labelling. This can be utilized as sub-diffraction emission for super-re...

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CV with attached letter,Online application form

Contact: Peter M Kraus | Email:

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